3   Artículos

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en línea
Catalin Palade, Adrian Slav, Ionel Stavarache, Valentin Adrian Maraloiu, Catalin Negrila and Magdalena Lidia Ciurea    
The high-k-based MOS-like capacitors are a promising approach for the domain of non-volatile memory devices, which currently is limited by SiO2 technology and cannot face the rapid downsizing of the electronic device trend. In this paper, we prepare MOS-... ver más
Revista: Coatings    Formato: Electrónico

 
en línea
He Guan and Shaoxi Wang    
Au-Pt-Ti/high-k/n-InAlAs metal-oxide-semiconductor (MOS) capacitors with HfO2-Al2O3 laminated dielectric were fabricated. We found that a Schottky emission leakage mechanism dominates the low bias conditions and Fowler?Nordheim tunneling became the main ... ver más
Revista: Coatings    Formato: Electrónico

 
en línea
Juan M. Carrillo and Carlos A. de la Cruz-Blas    
A bootstrapping technique used to increase the intrinsic voltage gain of a bulk-driven MOS transistor is described in this paper. The proposed circuit incorporates a capacitor and a cutoff transistor to be connected to the gate terminal of a bulk-driven ... ver más
Revista: Journal of Low Power Electronics and Applications    Formato: Electrónico

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