|
|
|
|
|
Octavian-Gabriel Simionescu, Oana Brîncoveanu, Cosmin Romanitan, Silviu Vulpe and Andrei Avram
In this work, the growth process of self-sustained vertically aligned carbon nanotubes (VA-CNTs) is investigated in full: from bare Si wafers to fully grown VA-CNTs on 4? wafers. Each developmental step, from supporting and catalyst layers? depositions t...
ver más
|
|
|
|
|
|
|
|
|
|
|
Sanghyun Jo, Suik Kang, Kyungjun Lee and Ho Jun Kim
This study investigates, numerically, the spatial distribution of metastable helium (He*) in He/SiH4 capacitively coupled plasma (CCP) for the purpose of optimizing plasma density distributions. As a first step, we presented the results of a two-dimensio...
ver más
|
|
|
|
|
|
|
|
|
|
|
Yongqiang Pan, Huan Liu, Zhuoman Wang, Jinmei Jia and Jijie Zhao
SiO2 thin films are deposited by radio frequency (RF) plasma-enhanced chemical vapor deposition (PECVD) technique using SiH4 and N2O as precursor gases. The stoichiometry of SiO2 thin films is determined by the X-ray photoelectron spectroscopy (XPS), and...
ver más
|
|
|
|
|
|
|
|
|
|
|
Mi-Young Park, Chun-Gon Kim and Joo-Hyung Kim
Reliability in various conditions for Li-ion batteries has been considered one of the most important factors when determining usability. Silica-based fabric has great potential to be an alternative material for electrode support, providing mechanical and...
ver más
|
|
|
|
|
|
|
|
|
|
|
Lucia V. Mercaldo, Iurie Usatii and Paola Delli Veneri
The conversion efficiency of thin-film silicon solar cells needs to be improved to be competitive with respect to other technologies. For a more efficient use of light across the solar spectrum, multi-junction architectures are being considered. Light-ma...
ver más
|
|
|
|
|
|
|
|
|
|
|
Andreas Reichel, Gerhard Franz and Markus-Christian Amann
Parylene, a non-critical, non-toxic layer material, which is not only a candidate for low-\(K\) dielectrics, but also well suited for long-term applications in the human body, has been deposited by (plasma-enhanced) chemical vapor deposition of the monom...
ver más
|
|
|
|
|
|
|
|
|
|
|
Huizhong Ma, Liandi Wang, Na Li, Junpu Li and Lan Zhang
Diamond-like carbon (DLC) has attracted much attention due to its unique properties such as high chemical inertness, optical transparency, and high biocompatibility. In this study, the total gas flow rate was kept constant, while the ratio of reactive ga...
ver más
|
|
|
|
|
|
|
|
|
|
|
Liam Ward, Fabian Junge, Andreas Lampka, Mark Dobbertin, Christoph Mewes and Marion Wienecke
In this study diamond like carbon (DLC) coatings with Si interlayers were deposited on 316L stainless steel with varying gas pressure and substrate bias voltage using plasma enhanced chemical vapor deposition (PECVD) technology. Coating and interlayer th...
ver más
|
|
|
|
|
|
|
|
|
|
|
Maheshwar Shrestha, Keliang Wang, Bocong Zheng, Laura Mokrzycki and Qi Hua Fan
Low-temperature growth of microcrystalline silicon (mc-Si) is attractive for many optoelectronic device applications. This paper reports a detailed comparison of optical properties, microstructure, and morphology of amorphous silicon (a-Si) thin films cr...
ver más
|
|
|
|
|
|
|
|
|
|
|
Tuung Luoh, Yu-Kai Huang, Yung-Tai Hung, Ling-Wuu Yang, Ta-Hone Yang and Kuang-Chao Chen
Titanium nitride (TiN) not only was utilized in the wear-resistant coatings industry but it was also adopted in barrier processes for semiconductor manufacturing. Barrier processes include the titanium (Ti) and TiN processes, which are commonly used as d...
ver más
|
|
|
|
|
|
|
|
|
|
|
Hai Tan, Deguo Wang and Yanbao Guo
A common belief proposed by Peierls and Landau that two-dimensional material cannot exist freely in a three-dimensional world has been proved false when graphene was first synthesized in 2004. Graphene, which is the base structure of other carbon materia...
ver más
|
|
|
|
|
|
|
|
|
|
|
Lubo? Podlucký, Andrej Vincze, Sona Kovácová, Juraj Chlpík, Jaroslav Kovác and Franti?ek Uherek
In this paper, the analysis of silicon oxynitride (SiON) films, deposited utilizing the plasma enhanced chemical vapor deposition (PECVD) process, for optical waveguides on silicon wafers is presented. The impact of N2O flow rate on various SiON film pro...
ver más
|
|
|
|
|
|
|
|
|
|
|
Eloisa Sardella, Roberto Gristina, Fiorenza Fanelli, Valeria Veronico, Gabriella Da Ponte, Jennifer Kroth, Francesco Fracassi and Pietro Favia
Plasma Enhanced?Chemical Vapor Deposition (PE-CVD) of polyethylene oxide-like (PEO)-like coatings represent a successful strategy to address cell-behavior on biomaterials. Indeed, one of the main drawbacks of organic and hydrophilic films, like PEO-like ...
ver más
|
|
|
|
|
|
|
|
|
|
|
Evgeniya Ermakova, Sergey Sysoev, Irina Tsyrendorzhieva, Alexander Mareev, Olga Maslova, Vladimir Shayapov, Eugene Maksimovskiy, Irina Yushina and Marina Kosinova
We report an investigation into 1,4-Bis-N,N-(trimethylsilyl)piperazine (BTMSP) as a novel precursor for the synthesis of silicon carbonitride films by chemical vapor deposition (CVD). The thermal stability, temperature dependence of vapor pressure and th...
ver más
|
|
|
|
|
|
|
|
|
|
|
Luana Mazzarella, Anna B. Morales-Vilches, Lars Korte, Rutger Schlatmann and Bernd Stannowski
Doped hydrogenated nanocrystalline (nc-Si:H) and silicon oxide (nc-SiOx:H) materials grown by plasma-enhanced chemical vapor deposition have favourable optoelectronic properties originated from their two-phase structure. This unique combination of qualit...
ver más
|
|
|
|
|
|
|
|
|
|
|
Mauro Menichelli, Marco Bizzarri, Maurizio Boscardin, Mirco Caprai, Anna Paola Caricato, Giuseppe Antonio Pablo Cirrone, Michele Crivellari, Ilaria Cupparo, Giacomo Cuttone, Silvain Dunand, Livio Fanò, Omar Hammad Alì, Maria Ionica, Keida Kanxheri, Matthew Large, Giuseppe Maruccio, Anna Grazia Monteduro, Francesco Moscatelli, Arianna Morozzi, Andrea Papi, Daniele Passeri, Marco Petasecca, Silvia Rizzato, Alessandro Rossi, Andrea Scorzoni, Leonello Servoli, Cinzia Talamonti, Giovanni Verzellesi and Nicolas WyrschaddShow full author listremoveHide full author list
Hydrogenated amorphous silicon (a-Si:H) can be produced by plasma-enhanced chemical vapor deposition (PECVD) of SiH4 (silane) mixed with hydrogen. The resulting material shows outstanding radiation hardness properties and can be deposited on a wide varie...
ver más
|
|
|
|
|
|