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Pengzhi Wei, Yanqiu Li, Tie Li, Naiyuan Sheng, Enze Li and Yiyu Sun
The continuous decrease in the size of lithographic technology nodes has led to the development of source and mask optimization (SMO) and also to the control of defocus becoming stringent in the actual lithography process. Due to multi-factor impact, def...
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Jiafeng Zhang, Guangli Cheng, Jinsong Tang, Haoran Wu and Zhen Tian
Uncompensated motion errors can seriously affect the imaging quality of synthetic aperture sonars (SASs). In the existing line-by-line motion compensation (MOCO) algorithms for wide-beam multiple-receiver SAS systems, the approximate form of the range hi...
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