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Yung-I Chen, Tso-Shen Lu and Zhi-Ting Zheng
In this study, equiatomic Ru?Zr coatings were deposited on Si wafers at 400 °C by using direct current magnetron cosputtering. The plasma focused on the circular track of the substrate holder and the substrate holder rotated at speeds within 1?30 rpm, re...
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