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Steffen Wilbrandt, Olaf Stenzel, Abrar Liaf, Peter Munzert, Stefan Schwinde, Sven Stempfhuber, Nadja Felde, Marcus Trost, Tina Seifert and Sven Schröder
Aluminum thin films with thicknesses between approximately 10 and 60 nm have been deposited by evaporation and sputtering techniques. Layer characterization focused on reflectance, optical constants, and surface quality. Reflectance fits have been perfor...
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