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Pi-Chen Lin, Kaifan Lin, Yu-Hsuan Lin, Kai-Chiang Yang, Vladimir Ivanovitch Semenov, Hsin-Chih Lin and Miin-Jang Chen
Polycrystalline HfZrO2 (HZO) film can be fabricated on as-extruded Mg?Ca alloy, which is identified by the results of XRD and TEM. HZO film can improve the corrosion resistance of as-extruded Mg?Ca alloy to further result in a decrease in the corrosion r...
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Sami Kinnunen, Manu Lahtinen, Kai Arstila and Timo Sajavaara
Zinc oxide (ZnO) thin films were grown by atomic layer deposition using diethylzinc (DEZ) and water. In addition to depositions with normal water, heavy water (2H2O) was used in order to study the reaction mechanisms and the hydrogen incorporation at dif...
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Christian Dussarrat, Nicolas Blasco, Wontae Noh, Jooho Lee, Jamie Greer, Takashi Teramoto, Sunao Kamimura, Nicolas Gosset and Takashi Ono
The thermal atomic layer deposition (ThALD) of yttrium oxide (Y2O3) was developed using the newly designed, liquid precursor, Y(EtCp)2(iPr2-amd), as the yttrium source in combination with different oxygen sources, such as ozone, water and even molecular ...
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David Vokoun, Ladislav Klim?a, Aliaksei Vetushka, Jan Duchon, Jan Racek, Jan Drahokoupil, Jaromír Kopecek, Yo-Shane Yu, Narmatha Koothan and Chi-Chung Kei
Pt coatings on NiTi film micro-actuators and/or sensors can add some useful properties, e.g., they may improve the NiTi anticorrosion and thermomechanical characteristics or activate surface properties beneficial for a specific application (e.g., functio...
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Jeongwoo Park, Neung Kyung Yu, Donghak Jang, Eunae Jung, Hyunsik Noh, Jiwon Moon, Deoksin Kil and Bonggeun Shong
Various processes based on atomic layer deposition (ALD) have been reported for growing Ti-based thin films such as TiN and TiO2. To improve the uniformity and conformity of thin films grown via ALD, fundamental understanding of the precursor?substrate s...
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Orsolya Kéri, Lenke Kócs, Zoltán Hórvölgyi, Zsófia Baji, Krisztina László, Viktor Takáts, Zoltán Erdélyi, Imre Miklós Szilágyi
Pág. 378 - 387
In this work, the photocatalytic properties of amorphous and crystalline TiO2 deposited on oxide and polymer nanoparticles by atomic layer deposition (ALD) were studied. Beside TiO2, as reference, both ALD grown amorphous Al2O3 and crystalline ZnO layers...
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Yonghua Wu, Jiali Yang, Shuanglong Wang, Zhitian Ling, Hao Zhang and Bin Wei
White organic light-emitting diodes (WOLEDs) with higher performance, which have enjoyed application in high-quality lighting sources, are here demonstrated with improved optical and electrical properties. The integration of a novel transparent distribut...
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Chao Zhao and Jinjuan Xiang
Metal gate of CMOS devices.
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Miia Mäntymäki, Mikko Ritala and Markku Leskelä
Lithium-ion batteries are the enabling technology for a variety of modern day devices, including cell phones, laptops and electric vehicles. To answer the energy and voltage demands of future applications, further materials engineering of the battery com...
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Robert Müller, Lilit Ghazaryan, Paul Schenk, Sabrina Wolleb, Vivek Beladiya, Felix Otto, Norbert Kaiser, Andreas Tünnermann, Torsten Fritz and Adriana Szeghalmi
High-density ruthenium (Ru) thin films were deposited using Ru(EtCp)2 (bis(ethylcyclopentadienyl)ruthenium) and oxygen by thermal atomic layer deposition (ALD) and compared to magnetron sputtered (MS) Ru coatings. The ALD Ru film growth and surface rough...
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Luis Javier Fernández-Menéndez, Ana Silvia González, Víctor Vega and Víctor Manuel De la Prida
In this work, the entire manufacturing process of electrostatic supercapacitors using the atomic layer deposition (ALD) technique combined with the employment of nanoporous anodic alumina templates as starting substrates is reported. The structure of a u...
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Kristin Pfeiffer, Ulrike Schulz, Andreas Tünnermann and Adriana Szeghalmi
Antireflection (AR) coatings are indispensable in numerous optical applications and are increasingly demanded on highly curved optical components. In this work, optical thin films of SiO2, Al2O3, TiO2 and Ta2O5 were prepared by atomic layer deposition (A...
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Po-Chou Chen, Shu-Mei Chang, Hao-Chung Kuo, Fu-Cheng Chang, Yu-An Li and Chao-Cheng Ting
In this research, a 14 nm high-performance computing application-specific integrated circuit was coated with a 5?20 nm Al2O3 thin film by atomic layer deposition in room-temperature conditions to study its performance in terms of reliability with differe...
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Baek-Ju Lee, Kyu-Beom Lee, Min-Ho Cheon, Dong-Won Seo and Jae-Wook Choi
In this study, we conducted research on manufacturing molybdenum (Mo) thin films by a thermal atomic layer deposition method using solid MoO2Cl2 as a precursor. Mo thin films are widely used as gate electrodes and electrodes in metal-oxide semiconductor ...
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Tatiana V. Ivanova, Tomá? Homola, Anton Bryukvin and David C. Cameron
The catalytic behaviour of Ag2O and Ag doped CeO2 thin films, deposited by atomic layer deposition (ALD), was investigated for diesel soot oxidation. The silver oxide was deposited from pulses of the organometallic precursor (hfac)Ag(PMe3) and ozone at 2...
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Richard Krumpolec, Tomá? Homola, David C. Cameron, Josef Humlícek, Ondrej Caha, Karla Kuldová, Raul Zazpe, Jan Prikryl and Jan M. Macak
Sequentially pulsed chemical vapour deposition was used to successfully deposit thin nanocrystalline films of copper(I) chloride using an atomic layer deposition system in order to investigate their application to UV optoelectronics. The films were depos...
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Petko Vitanov, Tatyana Ivanova, Hristosko Dikov, Penka Terziyska, Maxim Ganchev, Nikolay Petkov, Yordan Georgiev and Asen Asenov
ZnO/Ag/ZnO nanolaminate structures were deposited by consecutive RF sputtering at room temperature.The optical transparency, sheet resistance, and figure of merit are determined in relation to the deposition time of Ag and to the film thickness of the Zn...
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Jinkun Liu, Run Xu, Yan Zhu, De-Quan Yang, Heng-Yong Nie and Woon Ming Lau
We used atomic force microscopy (AFM) and X-ray photoelectron spectroscopy (XPS) to comprehensively study the growth and the cross-linking of dotriacontane (C32H66) nanofilms that were deposited on a silicon wafer by the spin-coating process. It was foun...
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Lourdes Gelde, Ana Laura Cuevas and Juana Benavente
The influence of geometrical parameters (pore radii and porosity) on ion transport through two almost ideal nanoporous alumina membranes (NPAMs) coated with a thin TiO2 layer by the atomic layer deposition technique (Sf-NPAM/TiO2 and Ox-NPAM/TiO2 samples...
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Talah Abohalkuma, Abdul Shaban, Judit Telegdi
Pág. 165 - 168
Self assembled monolayers (SAM) formed by fluoro-phosphonic and undecenyl-phosphonic acids on carbon steel surfaces as anticorrosive nanocoatings were investigated. The anticorrosive efficacy of these SAM layers was followed by atomic force microscopy, w...
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