Resumen
The vertical heterojunction Ga2O3 MOSFET (Metal-Oxide-Semiconductor Field-Effect Transistor) with the p-type oxide as the current-blocking layer (CBL) is investigated for the first time using SILVACO simulation software. The results show that the threshold voltage of the device is easily positive, which means that the device works in the enhancement mode. By adjusting the doping concentration (from 2 × 1017 cm-3 to 2 × 1018 cm-3) and thickness (from 0.4 um to 2 um) of p-SnO CBL, the threshold voltage is around from 2.4 V to 2.8 V and the breakdown voltage of the device can be increased from 361 V to 518 V. Compared with the original homojunction Ga2O3 vertical MOSFET with CBL, the p-SnO CBL can greatly improve the performance of the device. Other p-type oxides are also investigated as the CBL and show promising performances. This work has a certain guiding significance for the design of a vertical enhanced current-blocking layer MOSFET device and for the development of a Ga2O3 heterojunction power device.